Comparison of stabilizing treatments on porous silicon for sensor applications

Abstract

The stabilities of porous silicon samples after thermal oxidation, thermal carbonization, thermal nitridation and dodecene-treatment have been compared. The stability of these samples in different temperatures and RH-atmospheres was examined by measuring the weight increase as a function of time. Also, the reactivity of the stabilized porous silicon samples in ethanol and KOH-solution at 25 °C was measured using an isothermal microcalorimeter. Other important properties of stabilized porous silicon samples for sensing applications, such as a specific surface area and a humidity adsorption behavior have also been compared.