Applied Physics Letters · 2008 · 13 citations · 12 references
Natural SciencesMaterials SciencePhysicsElectronic MaterialsOptical MaterialsOpticsLaser PhysicsRadiation Damage In MaterialsRadiation HardeningRadiation-resistant MaterialsThermal Properties Of MaterialsX-ray OpticsCrystalline StructureDamage ThresholdsFree-electron LasersLaser FluenceRadiation Damage MechanismsTemperature Dependence Of Radiation DamageThermal DamageThermal Thresholds
Optical elements to be used for x-ray free electron lasers (XFELs) must withstand multiple high-fluence pulses. We have used an ultraviolet laser to study the damage of two candidate materials, crystalline Si and B4C-coated Si, emulating the temperature profile expected to occur in optics exposed to XFEL pulses. We found that the damage threshold for 105 pulses is ∼20% to 70% lower than the melting threshold.
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