High voltage electron beam lithography of the resolution limits of SAL 601 negative resist - Concepedia

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High voltage electron beam lithography of the resolution limits of SAL 601 negative resist

14

Citations

1

References

1992

Year

A. Claβen, S. Kuhn, J. Straka, A. Forchel

Microelectronic Engineering

Electrical EngineeringEngineeringElectron-beam LithographyBeam LithographyApplied PhysicsNegative ResistSal 601Electron MicroscopeResolution LimitsInstrumentationMicroelectronicsOptoelectronicsElectron OpticNanolithography Method

References

	Year	Citations

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