Journal of Applied Physics · 1984 · 102 citations · 14 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsMicroelectronicsSemiconductor DevicesCathode MaterialsElectrode MaterialsElectron Beam PhysicsIon ImplantationPlasma SourcesCathode Active MaterialsElectron Beam GenerationElectron Beam SourcesElectron Source DesignGlow DischargesIon Implantation EffectsSecondary Electron Emission
The operating characteristics of glow-discharge-created electron beams are discussed. Ten different cathode materials are compared with regard to maximum electron beam current achieved and the beam generation efficiency as measured calorimetrically. Specific electron gun designs are presented for a variety of applications that include: cw ion laser excitation; electron beam assisted chemical vapor deposition of microelectronic films; and wide area annealing of ion-implantation damage to silicon substrates. The use of sintered metal-ceramic (e.g., Mo-Al2O3) cathodes to generate multikilowatt electron beams in a pure noble gas discharge is reported. Cathode materials with high secondary electron emission coefficients by ion bombardment allow for electron beam production in glow discharges at 50%–80% generation efficiency values.
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Ion Energies at the Cathode of a Glow Discharge
William D. Davis, T. A. Vanderslice · Physical Review · 1963 · 378 citations
Electron beam assisted chemical vapor deposition of SiO2
L. R. Thompson, J. J. Rocca, Keith Emery et al. · Applied Physics Letters · 1983 · 34 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +17
Large area electron beam annealing
Cameron A. Moore, J. J. Rocca, T. Johnson et al. · Applied Physics Letters · 1983 · 24 citations · Full text