Publication | Closed Access
A gate probe method of determining parasitic resistance in MESFET's
42
Citations
4
References
1986
Year
Device ModelingElectrical EngineeringChannel ResistancesEngineeringNanoelectronicsElectronic EngineeringStress-induced Leakage CurrentBias Temperature InstabilityGate Probe MethodMicroelectronicsHigher Drain CurrentsSemiconductor Device
A gate probe method has been developed to accurately determine source, drain, and channel resistances of MESFET's. The method employs the gate current crowding phenomenon at higher drain currents. An exact equation was derived for the resistances whose fit to the data provides a self-consistent check of the determined parameters.
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