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Analysis of the Hydrogen Reduction of Silicon Tetrachloride Process on the Basis of a Quasi-Equilibrium Model
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1964
Year
EngineeringCrystal Growth TechnologyChemistryChemical EngineeringSilicon Tetrachloride ProcessGrowth RateThermodynamicsQuasi-equilibrium ModelProcess DesignGaseous ReductionHydrogen ReductionPhysical ChemistryHydrogen Production TechnologyHydrogenEquilibrium ModelHydrogen TransitionApplied PhysicsSilicon Single CrystalsReaction ProcessChemical KineticsChemical Vapor Deposition
The process for the growth of silicon single crystals by the hydrogen reduction of silicon tetrachloride has been described using a model which assumes that chemical equilibrium obtains at the silicon deposition site. The thermodynamic calculations by Lever for the equilibrium gas phase composition in the Si‐Cl‐H system (primarily , , , ) were used to calculate the growth rate of silicon as a function of mole fraction silicon tetrachloride input and temperature in an open tube system. Some of the features of the experimental results reported in the literature are predicted by the equilibrium model. The results are discussed in relation to similar calculations by Steinmaier who did not take the species into account.