The effect of power on the plasma‐assisted deposition of fluorinated monomers

Abstract

Abstract The effect of power variation on the polymerization kinetics and on the polymer structure is reported for RF glow discharges fed with C 2 F 6 –H 2 mixtures. Both deposition rate and polymer structure trends can be correlated to the variations of gas‐phase species density (atoms, radicals, and charged species) and can be explained by considering the competition of the deposition and etching process.