Publication | Closed Access
Atom probe analysis of interfacial abruptness and clustering within a single InxGa1−xN quantum well device on semipolar (101¯1¯) GaN substrate
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Citations
19
References
2011
Year
Wide-bandgap SemiconductorCategoryquantum ElectronicsEngineeringPolarization FieldAtom Probe AnalysisIndium HomogeneityElectron SpectroscopyQuantum MaterialsGan OrientationQuantum ScienceGan SubstrateCrystalline DefectsPhysicsAluminum Gallium NitrideAtomic PhysicsInterfacial AbruptnessCondensed Matter PhysicsApplied PhysicsGan Power DeviceQuantum Devices
Pulsed laser atom probe tomography (APT) of InxGa1−xN single quantum well (SQW) grown on semipolar (101¯1¯) GaN orientation estimates the interior atomic composition within the SQW at 6.5±0.7 at. % In, 46.2±0.7 at. % Ga, and 47.3±0.7 at. % N. The atom probe analysis is performed in both “top-down” and “cross-section” orientations. Self-consistent Schrödinger–Poisson simulation employing structural and compositional parameters obtained from APT results estimates the polarization field within the SQW at 720 kV/cm. A statistical method for the evaluation of indium homogeneity within the SQW is also considered.
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