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A method for analysis and profiling of boron, carbon and oxygen impurities in semiconductor wafers by recoil atoms in heavy ion beams

DOI

52

Citations

4

References

1984

Year

M. Petraşcu, I. Berceanu, I.M. Brâncuş, A. Buţă, M. Dūma, C. Grama, I. Lazǎr, Ioan Mihai, M. Petrovici, V. Simion,
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

References

YearCitations

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