Publication | Closed Access
Buried Heterostructure GaAs/GaAlAs Distributed Bragg Reflector Surface Emitting Laser with Very Low Threshold (5.2 mA) under Room Temperature CW Conditions
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Citations
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References
1989
Year
Wide-bandgap SemiconductorOptical MaterialsEngineeringBuried HeterostructureLaser ScienceLaser ApplicationsLaser MaterialOptoelectronic DevicesSurface-emitting LasersHigh-power LasersLaser ControlSemiconductor LasersCompound SemiconductorConventional Sio 2Sio 2PhotonicsElectrical EngineeringSemiconductor TechnologyOptoelectronic MaterialsApplied PhysicsVery Low ThresholdOptoelectronics
We would like to report on the performance of buried heterostructure (BH) GaAs/Ga 0.65 Al 0.35 As surface emitting (SE) lasers with p-type Ga 0.9 Al 0.1 As/Ga 0.4 Al 0.6 As and SiO 2 /TiO 2 multilayer Bragg reflectors (MBR) under room temperature CW conditins. The buried heterostructure was formed by a selective LPE growth technique with a Ga 0.55 Al 0.45 As mask instead of the conventional SiO 2 mask. The GaAlAs mask was very useful for forming uniformly small active regions of about 5 µm in diameter. Under room temperature CW conditions, the threshold current was 5.2 mA. The external differential quantum efficiency was about 16% and more than 0.6 mW of output power was obtained. The lasing wavelength was about 897 nm.
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