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Strain relief by periodic misfit arrays for low defect density GaSb on GaAs
257
Citations
14
References
2006
Year
Materials ScienceSemiconductorsElectrical EngineeringGasb DepositionPlanar Growth ModeEngineeringCrystalline DefectsLow Dislocation DensityDislocation InteractionElectronic EngineeringApplied PhysicsPeriodic Misfit ArraysThin FilmsEpitaxial GrowthOptoelectronicsStrain ReliefSemiconductor DeviceSemiconductor Nanostructures
We demonstrate the growth of a low dislocation density, relaxed GaSb bulk layer on a (001) GaAs substrate. The strain energy generated by the 7.78% lattice mismatch is relieved by a periodic array of 90° misfit dislocations. The misfit array is localized at the GaSb∕GaAs interface and has a period of 5.6nm which is determined by transmission electron microscope images. No threading dislocations are visible. The misfits are identified as 90°, rather than 60°, using Burger’s circuit analysis, and are therefore not associated with generation of threading dislocations. A low dislocation density and planar growth mode is established after only 3 monolayers of GaSb deposition as revealed by reflection high-energy electron diffraction patterns. Calculations corroborate the materials characterization and indicate the strain energy generated by the 7.78% lattice mismatch is almost fully dissipated by the misfit array. The low dislocation density bulk GaSb material on GaAs enabled by this growth mode will lead to new devices, especially in the infrared regime, along with novel integration schemes.
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