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Improvement of metal–ferroelectric–silicon structures without buffer layers between Si and ferroelectric films

DOI

10

Citations

0

References

2001

Year

W.P. Li, Y.M. Liu, R. Zhang, Jing Chen, Peng Cheng, Xiaoli Yuan, Yugang Zhou, Bo Shen, R.L. Jiang, Yi Shi,
Applied Physics A

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