Spectroscopic characterization of fluorinated silicon single crystal surfaces

Abstract

Spectroscopic studies of Si(100) fluorinated by the dissociative chemisorption of XeF2 at 80 K are reported. LEED and XPS measurements suggest the formation of a disordered fluorosilyl layer after low fluorine doses. Separate EELS experiments identified a fluorine induced 800 cm−1 loss, suggesting that SiF is the major surface fluorosilyl species. Vibrational evidence for coadsorbed hydrogen, due to side reactions during fluorination, is also found. Recent synchrotron soft x-ray photoemission spectra support the SiF identification and also demonstrate dramatic crystallographic effects in comparative Si(111) studies.