Temperature dependence of the sticking probability and molecular size of the film growth species in an atmospheric chemical vapor deposition process to form AlN from AlCl3 and NH3

Abstract

The sticking probability and molecular size of the growth species were determined as a function of deposition temperature ranging from 700 to 950 °C, in the AlN films prepared from AlCl3 and NH3. A novel method was developed, that includes the measurement of the film thickness profile on micron-sized trenches and the molecular diffusivity of the growth species. The molecular size was about 1 nm at 700–850 °C and decreased gradually with increasing temperature. The sticking probability increased from 0.02 to 0.5 in the temperature range 700–950 °C and, surprisingly, obeyed the Arrhenius law in spite of this large probability of sticking. The activation energy amounted to 136 kJ/mol.