Publication | Closed Access
Stark broadening of singly ionized-silicon
27
Citations
25
References
1977
Year
EngineeringOptical TestingStark BroadeningSilicon On InsulatorElectron OpticIon ImplantationElectron SpectroscopyOptical PropertiesInstrumentationIon EmissionDominant Broadening MechanismPhysicsAtomic PhysicsSynchrotron RadiationConventional Shock TubeStark EffectNatural SciencesSpectroscopyApplied PhysicsOptoelectronics
Linewidths and shifts of the five prominent visible Si II multiplets are measured in a conventional shock tube. The Stark effect from impacting plasma electrons is the dominant broadening mechanism. Electron densities range widely [(4-15) \ifmmode\times\else\texttimes\fi{} ${10}^{16}$ ${\mathrm{cm}}^{\ensuremath{-}3}$], but temperatures (9500-12 500\ifmmode^\circ\else\textdegree\fi{}K) do not. Optical depth and source inhomogeneity are rarely troublesome. Depending upon interference, blending, and signal-to-noise ratios, broadening-parameter accuracies are between 15-25% and shift uncertainties are 15-100%. Comparison data are examined.
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1967 | 2.2K | |
1956 | 1.7K | |
1949 | 1.2K | |
1958 | 636 | |
1958 | 574 | |
1975 | 500 | |
1962 | 380 | |
1968 | 358 | |
1962 | 289 |
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