Journal of Applied Physics · 1998 · 36 citations · 6 references
Natural SciencesMaterials EngineeringMaterials ScienceCondensed Matter PhysicsMechanical Behavior Of MaterialsThin FilmsMetalsNeutron DiffractionOptical Thin FilmsSurface PhysicsThin Film Mechanical PropertiesThin-film MaterialsEmbrittlementInterstitial SitesNeutron ReflectionReactive SputteringReflectivitySputteringSputtering ProcessesX-ray Diffraction Analysis
Ni/Ti multilayers have been studied for neutron‑optical devices, but sputtering in Ar produces low reflectivity because of interface roughness and interdiffusion. Reactive sputtering of Ni in Ar/air was used to smooth interfaces, and by tuning sputtering parameters to limit stress and embrittlement, the authors fabricated supermirrors with 600–1200 layers. X‑ray diffraction and stress measurements revealed a transition linked to nitrogen and oxygen occupying interstitial sites, and the resulting supermirrors achieved critical angles 3.65–4.15 times that of bulk Ni.
Multilayers containing Ni and Ti have been investigated for their applications in neutron-optical devices. These multilayers exhibit low neutron reflectivity when sputtered in Ar owing to large interface roughness and interdiffusion. While attempting to improve the interface smoothness by reactive sputtering of Ni in partial pressures of Ar and air, stress and embrittlement develops. Stress and x-ray diffraction measurements on Ni films and multilayers reveal a transition that is attributed to the occupancy of the interstitial sites by nitrogen and oxygen atoms. After identifying appropriate sputtering conditions so as to keep both macroscopic and local stresses within a tolerable limit, we have successfully prepared several supermirrors having 600–1200 layers yielding critical angles of reflection from 3.65 to 4.15 times that of bulk Ni.
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