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Three-dimensional characterization of conducting polymer arrays using secondary ion mass spectrometry
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1992
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EngineeringMicroscopyChemistryConducting PolymerAnalytical InstrumentationBeam LithographyThree-dimensional CharacterizationAnalytical ChemistryBiophysicsPolymer ChemistryNanolithography MethodMaterials ScienceImage DepthPolymer MixingPolymer AnalysisIon MicroscopySemiconducting PolymerScanning Probe MicroscopyPolymer ScienceMass SpectrometryApplied PhysicsPolymer CharacterizationMedicinePolymer Arrays
Image depth profiling with dynamic secondary ion mass spectrometry (SIMS), using ion microscopy and digital imaging, provided high spatial resolution 3D images of patterned polymer films prepared from [Ru(Me4bpy)2(vpy)2]2+ and {Fe[(CH2Br)2bpy]3}2+. Although 3D SIMS has been widely applied to semiconductor device characterization, this study represents a first attempt to characterize conductive polymer arrays. The SIMS studies were useful in localizing the polymer domains, and the extent of polymer mixing within the film structures. Volume-rendered images and reconstructed local area depth profiles indicated that electropolymerization of the poly-Fe complex was not limited to the channels in the poly-Ru resist produced by optical lithography. Quantification of the SIMS image depth profiles required consideration of detection system nonlinearities, ion yield variations (especially transients at the film/substrate interface), and native and sputter induced roughness of the polymer films.