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Optimal design of periodic surface texture for thin‐film a‐Si:H solar cells
49
Citations
14
References
2010
Year
Thin Film PhysicsOptical MaterialsEngineeringOptoelectronic DevicesPhotovoltaic DevicesThin Film Process TechnologyPhotovoltaic SystemPeriodic Surface TexturePhotovoltaicsSemiconductorsOptical PropertiesSolar Cell StructuresThin Film ProcessingThin-film TechnologySolar Energy UtilisationMaterials ScienceElectrical EngineeringOptoelectronic MaterialsOptimal DesignFinite Element MethodH Solar CellsSurface ScienceApplied PhysicsPeriodic TextureAbstract Optical AnalysisLight AbsorptionThin FilmsSolar CellsOptoelectronicsSolar Cell Materials
Abstract Optical analysis of hydrogenated amorphous silicon (a‐Si:H) solar cells with a periodic texture applied to the interfaces was carried out by two‐dimensional optical simulator. The optical simulator solves the electromagnetic wave equations by means of finite element method using triangular elements for the discretization of space. The periodic texture with rectangular‐like shape acts as a diffraction grating which scatters light into selective angles and thus gives a potential for significant prolongation of optical paths in thin absorber layers of the cells. Optimization of the geometrical parameters (period, height and duty‐cycle) of the periodic texture was carried out in order to obtain the highest photocurrent from a‐Si:H solar cells. The a‐Si:H solar cell with the optimal periodic texture parameters (period of 300 nm, height of 300 nm and duty cycle of 50%) and the absorber layer thickness of 300 nm generates up to 35% more photocurrent in comparison to the cell with flat interfaces. The optical analysis demonstrates that the optimal periodic texture in the a‐Si:H solar cell results in the best trade‐off between the antireflection effect at front interfaces, light scattering efficiency and the absorption losses at realistic metal back contact. Copyright © 2010 John Wiley & Sons, Ltd.
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