A new VDMOSFET structure with reduced reverse transfer capacitance

Abstract

A VDMOSFET structure with an additional p-region at the surface of the epitaxial layer is proposed. This structure realizes low reverse transfer capacitance without significantly degrading resistance. Reduction of the reverse transfer capacitance results in an improvement of the switching characteristics. The measured rise time is 49% and the fall time is 33% of the conventional VDMOSFET.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>