Influence of sputtering gases on the properties of magnetron sputtered tungsten films

Scherrer after sixty years: A survey and some new results in the determination of crystallite size

J. I. Langford, A. J. C. Wilson · Journal of Applied Crystallography · 1978 · 3.7K citations

X-ray Crystallography, Crystal Structure, Rare Earth Mineral +22

Energy dependence of the ion-induced sputtering yields of monatomic solids

N. Matsunami, Yasunori Yamamura, Yukikazu Itikawa et al. · Atomic Data and Nuclear Data Tables · 1984 · 788 citations

Materials Engineering, Materials Science, Ion Implantation +9

Polycrystalline TiN films deposited by reactive bias magnetron sputtering: Effects of ion bombardment on resputtering rates, film composition, and microstructure

I. Petrov, Lars Hultman, J.‐E. Sundgren et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 236 citations

Engineering, Film Composition, Thin Film Process Technology +17

Stress, strain, and microstructure of sputter-deposited Mo thin films

T.J. Vink, Marcel A.J. Somers, J. Daams et al. · Journal of Applied Physics · 1991 · 185 citations

Materials Science, Materials Engineering, Planar Magnetron +15

Stress, strain, and microstructure in thin tungsten films deposited by dc magnetron sputtering

T.J. Vink, W. Walrave, J. Daams et al. · Journal of Applied Physics · 1993 · 131 citations

Materials Science, Material Analysis, Engineering +15