Publication | Closed Access
Efficiency of a multilayer-coated, ion-etched laminar holographic grating in the 145–160-nm wavelength region
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Citations
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References
1997
Year
Transient GratingOptical MaterialsEngineeringElectron-beam LithographyHolographic MethodNear-normal IncidenceDigital HolographyFirst OrderBeam LithographyOptical PropertiesNanolithography MethodGroove EfficiencyMaterials ScienceMicroelectronicsDepth-graded Multilayer Coating145–160-Nm Wavelength RegionSurface ScienceApplied PhysicsOptoelectronics
The efficiency of an ion-etched laminar holographic grating was measured at near-normal incidence in the 14.5-16.0-nm wavelength range. The grating had an electron-beam-evaporated Mo/Si multilayer coating matched to the grating groove depth. The efficiency peaked at 16.3% in the first inside order at 15.12 nm and 15.0% in the first outside order at 14.94 nm. These are believed to be the highest efficiencies obtained to date from a multilayer-coated laminar grating at near-normal incidence in the EUV (lambda<30.0nm) . Zero and even orders were almost completely suppressed. The grating groove efficiency in the first order approached the theoretical limit of 40.5%.
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