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Mechanism of self-assembled growth of ordered GaAs nanowire arrays by metalorganic vapor phase epitaxy on GaAs vicinal substrates
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Citations
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References
2011
Year
SemiconductorsMaterials ScienceEpitaxial GrowthEngineeringElectronic MaterialsNanoengineeringNanotechnologyApplied PhysicsGaas Nanowire ArraysOptoelectronic DevicesNanofabricationNanostructure SynthesisMolecular Beam EpitaxySubstrate MisorientationCompound SemiconductorGaas Vicinal SubstratesSelf-assembled GrowthSemiconductor Nanostructures
We report the self-catalyzed growth of GaAs nanowire arrays by metalorganic vapor phase epitaxy (MOVPE) on GaAs vicinal substrates. The effect of substrate misorientation on the nanowire growth and the influence of growth parameters such as temperature and input V/III ratio have been studied in detail. Variation in the nanowire growth mechanism and consequential changes in the nanowire growth morphology were observed. A VLS growth mechanism with negligible effect of the vicinal surface gave rise to randomly distributed droplet-terminated GaAs nanowires at 400 °C and multiprong root-grown GaAs nanowire clusters at 500 °C with low V/III ratio. The substrate misorientation effect was dominant at 500 °C with higher V/III ratio, in which case the combined effect of the vicinal surface and the self-catalyzed Ga droplets assisted the realization of self-assembled and crystallographically oriented epitaxial nanowire arrays through the vapor-solid mechanism.
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