Concepedia

Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographies

M. Peuker, Michael Lim, Henry I. Smith, R. Morton, A. K. van Langen-Suurling, J. Romijn, E. W. J. M. van der Drift, F.C.M.J.M. van Delft

Microelectronic Engineering · 2002 · 32 citations · 3 references

DOI

Concepts

References

3

Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations

H. Namatsu, Toru Yamaguchi, Masao Nagase et al. · Microelectronic Engineering · 1998 · 156 citations

, , +8

Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography

F.C.M.J.M. van Delft, J. Weterings, A. K. van Langen-Suurling et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 111 citations

, , +14

Sub-10 nm Linewidth and Overlay Performance Achieved with a Fine-Tuned EBPG-5000 TFE Electron Beam Lithography System

Bernd E. Maile Bernd E. Maile, W. Henschel, H. Kurz et al. · Japanese Journal of Applied Physics · 2000 · 77 citations

, , +9