Concepedia

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Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographies

DOI

32

Citations

3

References

2002

Year

M. Peuker, Michael Lim, Henry I. Smith, R. Morton, A. K. van Langen-Suurling, J. Romijn, E. W. J. M. van der Drift, F.C.M.J.M. van Delft
Microelectronic Engineering

References

YearCitations

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