Well-defined triblock copolymers with a photolabile middle block of poly(phenyl vinyl ketone): facile synthesis, chain-scission mechanism and controllable photocleavability

Ruiwei Guo, Pengbo Mei, Qing Zhong, Yuan Yao, Qian Su, Jianhua Zhang

RSC Advances · 2015 · 22 citations · 39 references

Concepts

Abstract

Well-defined triblock copolymers with a photocleavable middle block were synthesized by RAFT polymerization and the photodegradation process was tracked by GPEC.

References

39