Electronics Letters · 1995 · 25 citations · 3 references
EngineeringElectrical EngineeringMaterials EngineeringElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsLaser DiodesSemiconductor Device MaterialsSemiconductor HeterostructuresSemiconductor LasersStrain EngineeringDiode Laser Threshold CurrentHeterostructure DevicesHeterostructure LasersLasersLow-threshold Current LasersSemiconductor Laser DiodesStrained Layer StructuresStrained Quantum Wells
An extremely low 0.4 mA threshold current has been achieved for novel current-blocking 1.3 µm strained MQW laser diodes. These devices are grown by MOVPE using tertiarybutylarsine (TBA) and tertiarybutylphosphine (TBP) precursors. The lowest threshold currents of 0.4 and 3.0 mA were obtained at 20 and 85°C, respectively, for a 150 µm-long 95%/98%-coated device.
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S. Ae, T. Terakado, Takahiro Nakamura et al. · Journal of Crystal Growth · 1994 · 32 citations