Japanese Journal of Applied Physics · 2012 · 100 citations · 17 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsSemiconductor DevicesSemiconductor MaterialsDevice CharacterizationMemory DevicesOxide SemiconductorsSemiconductor Device MaterialsSemiconductor PhysicsThin-film TransistorsSemiconductor CharacterizationSemiconductor Oxide Thin FilmsStandard Method Of Measurement
We measured a significantly low off-state current (135 yA/µm at 85 °C) of a metal oxide semiconductor (MOS) transistor using indium–gallium–zinc oxide (IGZO), which is an oxide semiconductor material. Note that “y” is 10 -24 . A transistor in which the hydrogen concentration in an IGZO film is lowered (5×10 19 cm -3 or lower) was used. To estimate the minute current accurately, we established a measurement method in which changes in the amount of electrical charge are measured for a long time. Such extremely low off-state current characteristics show promise for new applications of IGZO transistors in memories.
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