Evaluation of Off-State Current Characteristics of Transistor Using Oxide Semiconductor Material, Indium–Gallium–Zinc Oxide

Kiyoshi Katō, Yutaka Shionoiri, Yusuke Sekine, Kazuma Furutani, Takehisa Hatano, Taro Aoki, Miyuki Sasaki, Hiroyuki Tomatsu, Sunpei Yamazaki

Japanese Journal of Applied Physics · 2012 · 100 citations · 17 references

Concepts

Abstract

We measured a significantly low off-state current (135 yA/µm at 85 °C) of a metal oxide semiconductor (MOS) transistor using indium–gallium–zinc oxide (IGZO), which is an oxide semiconductor material. Note that “y” is 10 -24 . A transistor in which the hydrogen concentration in an IGZO film is lowered (5×10 19 cm -3 or lower) was used. To estimate the minute current accurately, we established a measurement method in which changes in the amount of electrical charge are measured for a long time. Such extremely low off-state current characteristics show promise for new applications of IGZO transistors in memories.

References

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