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Photoluminescence of ion-implanted GaN
341
Citations
10
References
1976
Year
Materials ScienceWide-bandgap SemiconductorElectrical EngineeringEngineeringApplied PhysicsIon-implanted GanDamage-annealing TreatmentAluminum Gallium NitrideMidgap StatesGallium OxideGan Power DeviceCategoryiii-v SemiconductorOptoelectronicsThirty-five Elements
Thirty-five elements were implanted in GaN. Their photoluminescence spectra were measured and compared to those of an unimplanted control sample. Most impurities emit a peak at about 2.15 eV. Mg, Zn, Cd, Ca, As, Hg, and Ag have more characteristic emissions. Zn provides the most efficient recombination center. A set of midgap states is generated during the damage-annealing treatment.
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