Electro-optic effects of (Pb, La)(Zr, Ti)O3 thin films prepared by rf planar magnetron sputtering

Abstract

Epitaxial (Pb, La)(Zr, Ti)O3 thin films were grown successfully on (0001) sapphire substrates at below 600 °C. High quadratic electro-optic coefficient of 0.8×10−16 (m/V)2 was also obtained at 6328 Å. The rf planar magnetron sputtering process improved the quality of the film, which will be suitable for thin-film integrated optic devices.