Publication | Closed Access
Intrinsic stress generation and relaxation of plasma-enhanced chemical vapor deposited oxide during deposition and subsequent thermal cycling
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Citations
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References
2003
Year
Materials ScienceEngineeringSubsequent Thermal CyclingSurface ScienceApplied PhysicsPlasma-enhanced Chemical VaporThermodynamicsChemical Vapor DepositionChemical DepositionGas Discharge PlasmaIntrinsic Stress GenerationPlasma Processing
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