Applied Physics Letters · 1994 · 137 citations · 11 references
Natural SciencesMaterials SciencePhysicsSemiconductor MaterialsSurface ScienceThin FilmsEpitaxial GrowthSemiconductor PhysicsSemiconductor SurfacesSemiconductor Thin FilmsSurface MorphologySurface PhysicsEpitaxial Film GrowthFilm Growth MechanismsHomoepitaxyIsland NucleationLarge-scale Structure FormationMolecular Beam EpitaxyStep-flow GrowthThin-film Growth Mechanisms
Atomic force microscopy studies have been performed on GaAs (001) homoepitaxy films grown by molecular beam epitaxy. Multilayered features are seen to evolve when the growth conditions favor island nucleation. As the epilayer thickness is increased these features grow in all dimensions but the angle of inclination remains approximately constant at 1°. The mounding does not occur on surfaces grown in step flow. We propose that the multilayered features are an unstable growth mode which relies on island nucleation and the presence of a step edge barrier.
11
Step Motion on Crystal Surfaces
Richard L. Schwoebel, Edward J. Shipsey · Journal of Applied Physics · 1966 · 1.6K citations
Stable and unstable growth in molecular beam epitaxy
Matthew D. Johnson, Christine A. Orme, A. W. Hunt et al. · Physical Review Letters · 1994 · 503 citations
Kinetic surface roughening in molecular beam epitaxy of InP
M. A. Cotta, R. A. Hamm, Thomas W. Staley et al. · Physical Review Letters · 1993 · 117 citations
Natural Sciences, Materials Engineering, Materials Science +17