Applied Physics Letters · 1971 · 12 citations · 4 references
Natural SciencesElectrical EngineeringPhysicsElectrochemistryPlasma PhysicsSemiconductor DevicesOxygen EffectThin Film OxidationAnodic OxidationAnodic Oxide FilmsAnodizationAnodizingFilm Growth MechanismsNegative Ion SourcesPlasma-assisted Oxidation
This letter describes an experiment which demonstrates that negative ions in the oxygen discharge are the source of the oxygen incorporated in the anodic oxide. By use of time-varying electric fields, negative oxygen ions are eliminated from the anodizing current. Under this condition, film growth is not observed.
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