Formation of Ni-Zn-Ferrite Films Using Laser Ablation

Abstract

Ni-Zn-ferrite thin films were formed on glass substrate by a laser ablation method employing a KrF excimer laser at wave-length 248 nm and frequency 15 Hz. Film was deposited on substrate at room temperature, 200°C and 350°C, to a thickness of 2 μm. Ni-Zn-ferrite films thus prepared had the spinel structure when the substrate temperature was raised to 200°C. The saturation magnetic flux densities of Ni-Zn-ferrite films annealed at 400°C were between 1300 and 2020 G. The coercive force of annealed Ni-Zn-ferrite films decreased from 534 to from 70 to 113 Oe as the N <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O gas pressure was decreased from 1×10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-2</sup> Torr to 1×10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-5</sup> Torr.