Applied Physics Letters · 1980 · 109 citations · 5 references
Natural SciencesElectrical EngineeringMaterials ScienceElectronic MaterialsOpticsSemiconductor DevicesEtching ProcessesLaser PhysicsLaser Surface ProcessingDevice FabricationEtch RateEtch Rate ModelingEtchingLaser PhotolysisPhotolysis ProcessesPhysical Model Testing
Ultraviolet laser photolysis of methyl-halides has been used to produce localized photoetching of GaAs and InP. A spatial resolution of ≃1μm has been achieved and an etch rate ≳104 times that of the dark reaction demonstrated. A chemical mechanism is proposed and the observed resolution is explained by a simple physical model.
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On the Recombination of Iodine and Bromine Atoms
O. K. Rice · The Journal of Chemical Physics · 1941 · 42 citations
Natural Sciences, Chemistry, Physics +17
I. M. Beterov, V. P. Chebotaev, N I Yurshina et al. · Soviet Journal of Quantum Electronics · 1978 · 27 citations