Laser-induced microscopic etching of GaAs and InP

D. J. Ehrlich, Richard M. Osgood, Thomas F. Deutsch

Applied Physics Letters · 1980 · 109 citations · 5 references

Concepts

Abstract

Ultraviolet laser photolysis of methyl-halides has been used to produce localized photoetching of GaAs and InP. A spatial resolution of ≃1μm has been achieved and an etch rate ≳104 times that of the dark reaction demonstrated. A chemical mechanism is proposed and the observed resolution is explained by a simple physical model.

References

5