Publication | Closed Access
Effects of As and Mn doping on microstructure and electrical conduction in ZnO films
28
Citations
12
References
2006
Year
EngineeringO FilmsGrain SizeMn DopingElectrical ConductionNanoelectronicsMolecular Beam EpitaxyPulsed Laser DepositionEpitaxial GrowthZno FilmsMaterials EngineeringMaterials ScienceElectrical EngineeringNanotechnologyOxide ElectronicsSemiconductor MaterialElectrical PropertyMaterial AnalysisApplied PhysicsThin Films
We report the synthesis of epitaxial As-doped ZnO and Mn-doped (ZnAs)O films by pulsed-laser deposition technique. The grain size in (ZnAs)O films decreases from 40 to less than 10nm upon Mn doping, illustrating that Mn acts as a potential catalyst to create nanosize grains. Temperature dependent electrical resistance shows metal-insulator transition and metal-semiconductor transition (MST) at 165 and 115K, respectively, in (ZnAs)O, although Mn doping suppresses MST completely. Both ionization efficiency on oxygen vacancies and percolation of charge carriers may be responsible for such transitions. In addition, electrical conduction in these films shows strong aging effects.
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