Boron Redistribution in Silicon by Thermal Oxidation

Abstract

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation F. Leuenberger; Boron Redistribution in Silicon by Thermal Oxidation. Journal of Applied Physics 1 September 1962; 33 (9): 2911. https://doi.org/10.1063/1.1702585 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAIP Publishing PortfolioJournal of Applied Physics Search Advanced Search |Citation Search