Micropatterned Freestanding Superelastic TiNi Films

Abstract

Abstract Micropatterned freestanding superelastic TiNi films in the thickness range between 20 and 100 µm are attractive materials for medical in vivo applications. Micropatterning of these materials by UV lithography and etching is a challenging task, as wet etching has severe design limitations due to its isotropic nature while dry etching shows much to low etching rates. This study presents a method to fabricate freestanding TiNi films (with thicknesses higher than 20 µm) with a minimum feature size 5 µm based on UV lithography, sacrificial layer and wet etching technology. This method was successfully applied to the fabrication of TiNi films with 50 µm thickness and 25 µm feature size. These superelastic films showed remarkable tensile strengths up to 1100 MPa and elongations upon fracture of more than 40%.