Practical Electron Beam Recorder for High-Density Optical and Magnetic Disk Mastering

Abstract

Electron beam mastering is a promising technique to realize next-generation disk media. We have been developing electron beam recorders since 1993 and have proved their effectiveness for high-density disk fabrication. To introduce electron beam mastering technology into practical application in next-generation disk mastering, we developed a new electron beam recorder as a commercial prototype. The electron beam recorder was improved in terms of recording resolution, beam-blanking characteristic and recording stability. For production use, a load-lock system was adopted to improve throughput, and the recording and substrate exchange operations were automated through computer control. The recording stability was proved experimentally by fabricating 100-GB-capacity stampers recorded on the whole recording area of 22 to 58 mm radius with a good pattern size uniformity. A superhigh-density patterning of 350 Gbit/in.2 density (510 GB capacity/layer) was realized for the next-generation optical disk, and a 35 nm line and space pattern could be fabricated for the next-generation magnetic disk.