Removal of Diazonaphthoquinone/Novolak Resist Using UV Laser (266 nm)

Patterning, electroplating and removal of SU-8 moulds by excimer laser micromachining

Muralidhar K. Ghantasala, Jason P. Hayes, Erol C. Harvey et al. · Journal of Micromechanics and Microengineering · 2001 · 83 citations

Engineering, Materials Engineering, Materials Science +15

Effects of polymer properties on laser ablation behaviour

Duy Khanh Pham, Livia Tonge, Jinan Cao et al. · Smart Materials and Structures · 2002 · 49 citations

Natural Sciences, Chemical Engineering, Materials Science +17

Development of a Photoresist Removal Method Using Ozone Gas with Water Vapor for LCD Manufacturing

Seiji Noda, Makoto Miyamoto, Hideo Horibe et al. · Journal of The Electrochemical Society · 2003 · 41 citations

Natural Sciences, Manufacturing Engineering, Materials Engineering +13

Enhancement of Surface-Damage Resistance by Removing Subsurface Damage in Fused Silica and Its Dependence on Wavelength

Tomosumi Kamimura, Shigenori Akamatsu, Hideo Horibe et al. · Japanese Journal of Applied Physics · 2004 · 26 citations

Engineering, Materials Engineering, Materials Science +17

Temperature and concentration effects on ozone ashing of photoresist

W. L. Gardner, Arthur P. Baddorf, W. M. Holber · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 26 citations

Natural Sciences, Chemistry, Materials Science +15