Publication | Closed Access
Excimer-laser-induced etching of ceramic PbTi1−<i>x</i>Zr<i>x</i>O3
58
Citations
4
References
1987
Year
Materials ScienceOptical MaterialsLaser RadiationEngineeringApplied PhysicsLaser ApplicationsExcimer-laser-induced EtchingLaser MaterialLaser Processing TechnologyThreshold FluenceOptoelectronic DevicesCeramic Pbti1−xzrxo3Laser-assisted DepositionPulsed Laser DepositionLaser-surface InteractionsPlasma EtchingHigh-power LasersExcimer Lasers
The etching of ceramic PbTi1−xZrxO3 (PZT) by XeCl excimer laser radiation has been investigated. In air, the threshold fluence for etching was about 2 J/cm2. At fluences of 10 J/cm2, etch rates of 0.1 μm/pulse were observed. The geometry of etched structures can readily be defined by choosing suitable experimental conditions, suggesting potential applications of this process to the production of devices.
| Year | Citations | |
|---|---|---|
Page 1
Page 1