Applied Physics Letters · 1985 · 88 citations · 5 references
Materials ScienceSemiconductorsIi-vi SemiconductorEngineeringPhysicsCrystalline DefectsApplied PhysicsQuantum MaterialsCondensed Matter PhysicsBe Surface AccumulationSuperlattice StructureAlas/gaas SuperlatticeSemiconductor MaterialMolecular Beam EpitaxyEpitaxial GrowthSolid-state Physic
Effects of Be doping and the interaction of Be and Si on the disordering of 15-nm AlAs/15-nm GaAs superlattices were studied. Be doping of more than 4×1019 cm−3 causes the intermixing of Al and Ga during epitaxial growth and the effect of Be surface accumulation is observed at the growth temperature of 540 °C, while after incorporation of Be in the crystal the annealing of 750 °C, 2 h does not cause any remarkable change in the superlattice structure. Be doping in the Si-doped superlattice shows remarkable suppression of the disordering of superlattice when the Be doping level exceeds that of Si.
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Disorder of an AlAs-GaAs superlattice by impurity diffusion
W. D. Laidig, N. Holonyak, M. D. Camras et al. · Applied Physics Letters · 1981 · 598 citations
Interdiffusion between GaAs and AlAs
L.L. Chang, A. Koma · Applied Physics Letters · 1976 · 206 citations
Materials Science, Semiconductors, Wide-bandgap Semiconductor +11