Applied Physics Letters · 1985 · 88 citations · 5 references
Natural SciencesMaterials SciencePhysicsCondensed Matter PhysicsElectronic MaterialsSemiconductor MaterialsDopingEpitaxial GrowthSemiconductor Crystal GrowthSemiconductor DefectsSemiconductor InterfacesSemiconductor PhysicsCrystal DopingDisordered SemiconductorsDoping BehaviorDoping EffectsDoping Effects On Electronic PropertiesSemiconductor DopingSilicon DopingSuperlattice Growth
Effects of Be doping and the interaction of Be and Si on the disordering of 15-nm AlAs/15-nm GaAs superlattices were studied. Be doping of more than 4×1019 cm−3 causes the intermixing of Al and Ga during epitaxial growth and the effect of Be surface accumulation is observed at the growth temperature of 540 °C, while after incorporation of Be in the crystal the annealing of 750 °C, 2 h does not cause any remarkable change in the superlattice structure. Be doping in the Si-doped superlattice shows remarkable suppression of the disordering of superlattice when the Be doping level exceeds that of Si.
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Disorder of an AlAs-GaAs superlattice by impurity diffusion
W. D. Laidig, N. Holonyak, M. D. Camras et al. · Applied Physics Letters · 1981 · 599 citations
Interdiffusion between GaAs and AlAs
L.L. Chang, A. Koma · Applied Physics Letters · 1976 · 206 citations
Disorder of an AlAs-GaAs superlattice by silicon implantation
J. J. Coleman, P.D. Dapkus, C. G. Kirkpatrick et al. · Applied Physics Letters · 1982 · 187 citations