Tuning of the metal-insulator transition in electrolyte-gated NdNiO3 thin films

Abstract

We demonstrate electrostatic control of the metal-insulator transition in the typical correlated-electron material NdNiO3 through a large effective capacitance of the electric double layer at the electrolyte/NdNiO3 interface. The metal-insulator transition temperature (TMI) of NdNiO3 is shown to decrease drastically with increasing hole concentration through the application of a negative gate voltage (VG). The shift in TMI (|ΔTMI|) is larger for thinner NdNiO3; for VG of −2.5 V, |ΔTMI| of 5-nm-thick NdNiO3 is as large as 40 K, and the resistivity change near 95 K is one order of magnitude. This study may be potentially applicable to Mott transistor devices.