Publication | Closed Access
Inductively coupled plasma chemical vapour deposited AlOx/SiNy layer stacks for applications in high-efficiency industrial-type silicon solar cells
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Citations
32
References
2013
Year
Chemical EngineeringElectrical EngineeringEngineeringPlasma Chemical VapourSurface ScienceApplied PhysicsVacuum DeviceChemical Vapor DepositionPlasma ProcessingPlasma EtchingAlox/siny Layer StacksPhotovoltaics
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