A comparative study on the properties of TiN films prepared by chemical vapor deposition enhanced by r.f. plasma and by electron cyclotron resonance plasma - Concepedia

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A comparative study on the properties of TiN films prepared by chemical vapor deposition enhanced by r.f. plasma and by electron cyclotron resonance plasma

13

Citations

7

References

1997

Year

Jongseok Kim, Byung‐Hyuk Jun, Eung-Jik Lee, Chanyong Hwang, Won‐Jong Lee

Thin Solid Films

Materials ScienceTin FilmsEngineeringApplied PhysicsChemical Vapor DepositionThin FilmsChemical DepositionComparative StudyPlasma ProcessingThin Film Processing

References

	Year	Citations

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