Journal of Applied Physics · 2002 · 90 citations · 11 references
Natural SciencesMaterials EngineeringMaterials ScienceCeramic MaterialsMaterials PhysicsThin FilmsDevice SimulationDielectric CeramicsDielectricsElectrical Properties Of CeramicsThin Film Electrical PropertiesThin-film MaterialsCapacitance-voltage CharacteristicsDielectric HysteresisHysteresisHysteresis In Capacitance-voltage CurvesOxide DielectricsStress MeasurementThickness EffectsThin Oxide Films
This work studies and presents an inner-interface trapping physical model for the ultra-thin (effective oxide thickness=15 Å) zirconium oxide (ZrO2) film to explain its hysteresis phenomenon. The shift of the capacitance–voltage characteristics swept from accumulation to inversion and then swept back with light illumination is about 110 mV, which is larger than the shift without light illumination (∼45 mV). The mobile ion effect is obviated using bias-temperature stress measurement. The proposed model successfully explains not only the phenomenon but also the thickness effect for the capacitance–voltage characteristics and the different turn-around voltages of the current density–voltage characteristics of the zirconium dielectrics.
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1.5 nm direct-tunneling gate oxide Si MOSFET's
H. Sasaki, Mizuki Ono, T. Yoshitomi et al. · IEEE Transactions on Electron Devices · 1996 · 346 citations