Crystal growth and orientation in vacuum-condensed metal deposits: a systematic correlation with residual pressure, rate of deposition and thickness

Abstract

Extensive electron diffraction studies have been made of the surface structure of tin films condensed in vacuum on to glass substrates initially at room temperature. Rates of deposition were 0-150 Å s−1, film thicknesses up to 5000 Å and residual air pressures 10−8-10−3 torr.