Applied Physics Letters · 1993 · 35 citations · 4 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials ChemistrySemiconductor MaterialsSolid-state ChemistryAmorphous Electronic MaterialsAmorphous SemiconductorsCrystal EngineeringSemiconductor Crystal GrowthSemiconductor NanomaterialsAmorphous GermaniumCross-sectional MicroscopyNanocrystal Growth MechanismsNanocrystal SynthesisNanocrystalline MaterialsSilica-based MaterialsSilicon AnnealingSilicon Dioxide
We have synthesized nanocrystalline Ge in vitreous SiO2 by annealing amorphous Ge0.38Si0.62O2 in hydrogen at 700 °C. The germanium dioxide in Ge0.38Si0.62O2 is thermodynamically unstable in the presence of hydrogen and thus precipitates out as elemental Ge. Elemental Si is not needed in this reduction process. Cross-sectional transmission electron microscopy reveals that the nucleation process is homogeneous, leading to a uniform distribution of small Ge crystallites imbedded in the remaining vitreous SiO2.
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Wet oxidation of GeSi at 700 °C
W. S. Liu, E. W. Lee, M.−A. Nicolet et al. · Journal of Applied Physics · 1992 · 56 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +17