Modeling the effect of native and laser-induced states on the dielectric breakdown of wide band gap optical materials by multiple subpicosecond laser pulses

Abstract

A model for the multiple-pulse laser-induced breakdown behavior of dielectrics is presented. It is based on a critical conduction band (CB) electron density leading to dielectric breakdown. The evolution of the CB electron density during the pulse train is calculated using rate equations involving transitions between band and mid-gap states (native and laser-induced). Using realistic estimations for the trap density and ionization cross-section, the model is able to reproduce the experimentally observed drop in the multiple-pulse damage threshold relative to the single-pulse value, as long as the CB electron density is controlled primarily by avalanche ionization seeded by multiphoton ionization of the traps and the valence band. The model shows that at long pulse duration, the breakdown threshold becomes more sensitive to presence of traps close (within one photon energy) to the CB. The effect of native and laser-induced defects can be distinguished by their saturation behavior. Finally, measurements of the multiple-pulse damage threshold of hafnium oxide films are used to illustrate the application of the model.