Evaluation of the initial oxidation of heavily phosphorus doped silicon surfaces using angle-dependent X-ray photoelectron spectroscopy - Concepedia

Concepedia

Publication | Closed Access

Evaluation of the initial oxidation of heavily phosphorus doped silicon surfaces using angle-dependent X-ray photoelectron spectroscopy

18

Citations

9

References

1999

Year

W.B. Ying, Yusuke Mizokawa, Katsuto Tanahashi, Y. Kamiura, Makio Iida, K. Kawamoto, Wei Yang

Thin Solid Films

Surface CharacterizationEngineeringSurface AnalysisSurface ScienceApplied PhysicsSemiconductor Device FabricationChemistrySilicon SurfacesSilicon On InsulatorInitial Oxidation

References

	Year	Citations

Page 1