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Physical properties of undoped and doped hydrogenated amorphous silicon carbide
29
Citations
14
References
1991
Year
Materials ScienceMaterials EngineeringElectrical EngineeringSemiconductor DeviceEngineeringNanoelectronicsApplied PhysicsPhosphorus Dopant AtomsExcess AbsorptionSemiconductor MaterialCarbideHydrogenThin FilmsSilicon On InsulatorAmorphous SolidCompound SemiconductorUrbach EnergyPhysical Properties
A systematic study on the basic characteristics of p-type a-SiC:H films doped with B2H6 and n-type doped with PH3 is presented. The effect of doping on the optical and electrical properties of the films has been examined. The results obtained on energy gap, spin density, Urbach energy and integral of excess absorption suggest that the phosphorus dopant atoms introduce fewer additional defects than does boron. The difference in the behaviour of the two types of doping has been attributed to the chemistry of boron and phosphorus.
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