A Protocol for the Verification of Acid Generation in 157 nm Lithography

Abstract

ADVERTISEMENT RETURN TO ISSUEPREVCommunication to the...Communication to the EditorNEXTA Protocol for the Verification of Acid Generation in 157 nm LithographyJ. C. Scaiano, Marie Laferriere, Marius G. Ivan, and Gary N. TaylorView Author Information Department of Chemistry, University of Ottawa, Ottawa, Ontario, Canada K1N 6N5 Shipley Company, Research and Development Laboratories, 455 Forest Street, Marlborough, Massachusetts 01752-3092 Cite this: Macromolecules 2003, 36, 18, 6692–6694Publication Date (Web):August 6, 2003Publication History Received28 March 2003Revised1 July 2003Published online6 August 2003Published inissue 1 September 2003https://pubs.acs.org/doi/10.1021/ma034397dhttps://doi.org/10.1021/ma034397drapid-communicationACS PublicationsCopyright © 2003 American Chemical SocietyRequest reuse permissionsArticle Views234Altmetric-Citations25LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-AlertscloseSupporting Info (1)»Supporting Information Supporting Information SUBJECTS:Absorption,Dyes and pigments,Fluorescence,Lasers,Thin films Get e-Alerts